Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves...

of 193 nm excimer laser lithography technology. High-index immersion lithography is the newest extension of 193 nm lithography to be considered. In 2006...

Lam Research and Cadence Design Systems.[citation needed] Since immersion lithography was first proposed by Burn-Jeng Lin in the 1970s, ASML cooperated...

for EUV lithography is at least 250 W, while for other conventional lithography sources, it is much less. For example, immersion lithography light sources...

Teeth Productions Immersion journalism, a style of journalism Immersion lithography or immersion microscopy, optical techniques in which liquid is between...

SSA600 series machines has been described by observers as an immersion deep ultraviolet lithography tool which features an argon fluoride (ArF) excimer laser...

has gradually progressed to deep-UV immersion lithography using optical proximity correction, inverse lithography technology, off-axis illumination, phase-shift...

cedar oil. Immersion lithography Index-matching material Solid immersion lens Water immersion objective "Microscope Objectives: Immersion Media" by Mortimer...

Triple-core Dual-core Single-core Codename Llano Propus Rana Regor Sargas Lithography 32 nm 45 nm Socket FM1 AM3 Date released Aug 2011 Feb-Jun 2012 Sep 2009...

and fan is approximately 4 GHz. Six AMD K10 cores 45 nm SOI with immersion lithography and low-κ insulator L1 cache: 64 KB + 64 KB (data + instructions)...

Computational lithography (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution...

Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput...

debuted a 0.24-square-micrometre 45 nm SRAM cell, with the help of immersion lithography. In November 2006, UMC announced that it had developed a 45 nm SRAM...

billion transistors. 193 nm immersion lithography was used for the critical layers, while 193 nm or 248 nm dry lithography was used on less critical layers...

remaining one trimmed to a much smaller final linewidth. Whereas immersion lithography has a resolution of ~40 nm lines and spaces, spacer patterning may...

been proposed for use as a lens material in high refractive index immersion lithography. Additionally, a tiny amount of lutetium is added as a dopant to...

taped out 3nm test chips, using extreme ultraviolet lithography (EUV) and 193 nm immersion lithography. In early 2019, Samsung presented plans to manufacture...

ultraviolet lithography (EUV). TSMC's "7nm" production plans, as of early 2017,[needs update] was to use deep ultraviolet (DUV) immersion lithography initially...

and are cheaper to produce. Another application of HRIPs is in immersion lithography. In 2009 it was a new technique for circuit manufacturing using...

the associated optical data storage can be increased. Similar to immersion lithography, the use of SIL can increase spatial resolution of projected photolithographic...

relying solely on phase-shifting for imaging. The emergence of immersion lithography has a strong impact on photomask requirements. The commonly used...

focused into extremely sharp images. Using various techniques such as immersion lithography and phase-shifting photomasks, it has indeed been possible to make...

30 nm, which is also achievable using current state-of-the-art immersion lithography. Hardmask materials and multiple patterning are required. A more...

9776, 97760F (2016). Samsung receives 24 immersion tools from ASML in 2010 Extending immersion lithography to 1xnm nodes EUV Errors Under Attack M. C...

POU UPW application for lithography is the immersion water used at the lens/wafer interface for 193 nm immersion lithography patterning. The UPW forms...

tenure at IBM, which began in 1970, Lin became the first to propose immersion lithography, a technique that became viable in the 1980s. Lin left IBM to found...

IM Flash has been able to devise 25-nm NAND chips with 193-nm immersion lithography, plus self-aligned double-patterning (SADP) techniques, where it...

will be manufactured via stockpiled ASML "deep ultra-violet" (DUV) immersion lithography machines. The new chips are expected to be produced at SMIC's new...

leaving behind a desired structure. Several optical lithography techniques require the use of liquid immersion and a host of resolution enhancement technologies...

nanoimprint lithography) or for testing photoresist processes for lithography techniques based on new wavelengths (e.g., EUV or 193 nm immersion). In addition...