A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to...

material, called a photoresist, being applied to the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone...

SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while...

techniques; photoresist and non-photoresist mastering. Photoresist also comes in two variations; positive photoresist and negative photoresist. Photoresist mastering...

process possible through the combined use of hexamethyldisilazane (HMDS), photoresist (positive or negative), spin coating, photomask, an exposure system and...

photomask in direct contact with a substrate coated with an imaging photoresist layer. The first integrated circuits had features of 200 micrometres...

photochemical reaction in the polymer phase. Photoresists can be classified as positive or negative. In positive photoresists, the photochemical reaction that occurs...

manufacturing, including equipment for thin film deposition, plasma etch, photoresist strip, and wafer cleaning processes. Throughout semiconductor manufacturing...

material to be used as a photoresist to fabricate 3-D nanostructures. As2S3 has been investigated for use as a high resolution photoresist material since the...

on top of the photoresist. This topcoat would serve as a barrier for chemical diffusion between the liquid medium and the photoresist. In addition, the...

semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a plasma source...

intensively in photolithography, to deposit layers of photoresist about 1 micrometre thick. Photoresist is typically spun at 20 to 80 revolutions per second...

longer. Curable materials are widely used for medical, printing, and photoresist technologies. Changes in structural and chemical properties can be induced...

material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require...

cleaning Surface passivation Photolithography Photoresist coating (often as a liquid, on the entire wafer) Photoresist baking (solidification in an oven) Edge...

reagent in photoresist technology in the semiconductor industry. Diazonaphthoquinone sulfonic acid esters are components of common photoresist materials...

Photoengraving is a process that uses a light-sensitive photoresist applied to the surface to be engraved to create a mask that protects some areas during...

thicknesses of both a-Si and SiO2 were allowed to vary. Polymers such as photoresist consist of long chains of molecules which do not form a crystallographic...

surface of a substrate (e.g. wafer) using a sacrificial material (e.g. photoresist). It is an additive technique as opposed to more traditional subtracting...

and developer to selectively remove a UV-sensitive photoresist coating and thus create a photoresist mask that will protect the copper below it. Direct...

Partially developed photoresist in Nomarski DIC...

called a photoresist is exposed to UV radiation that has passed through a mask. The exposure causes chemical reactions to occur in the photoresist. After...

of light-sensitive material (photoresist). This procedure is repeated dozens of times on a single wafer. The photoresist is then further processed to...

are especially important in microelectronics where they are used as photoresist materials. They are also used as tackifiers in rubber. Epoxy Ralph Dammel...

circuit in the integrated circuit. Ultraviolet light is used along with a photoresist layer to create a chemical change that generates the patterns for the...

of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist...

Dry Photoresist Removal Method". Journal of the Electrochemical Society. Irving S. (1968). "A Dry Photoresist Removal Method". Kodak Photoresist Seminar...

high-aspect-ratio structures requires the use of a photoresist able to form a mold with vertical sidewalls; thus, the photoresist must have a high selectivity and be...

semiconductor manufacturing, a mask can selectively expose a layer of photoresist on a substrate made of a semiconductor material, such as a silicon dioxide...

pattern by using a reflective photomask to expose a substrate covered by photoresist. Tin ions in the ionic states from Sn IX to Sn XIV give photon emission...