• Thumbnail for Extreme ultraviolet lithography
    Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits...
    119 KB (13,929 words) - 15:44, 6 November 2024
  • Thumbnail for ASML Holding
    ASML Holding (redirect from ASM Lithography)
    semiconductor industry and the sole supplier in the world of extreme ultraviolet lithography (EUV) photolithography machines that are required to manufacture...
    42 KB (3,456 words) - 23:03, 7 November 2024
  • Thumbnail for Extreme ultraviolet
    the terms. The main uses of extreme ultraviolet radiation are photoelectron spectroscopy, solar imaging, and lithography. In air, EUV is the most highly...
    13 KB (1,518 words) - 03:52, 22 September 2024
  • including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography (EUVL), and X-ray lithography. The wavelength of light...
    58 KB (6,445 words) - 02:12, 12 September 2024
  • Thumbnail for Ultraviolet
    wavelength bands in the UV spectrum. 13.5 nm: Extreme ultraviolet lithography 30–200 nm: Photoionization, ultraviolet photoelectron spectroscopy, standard integrated...
    117 KB (12,670 words) - 01:09, 7 November 2024
  • Thumbnail for X-ray lithography
    generate secondary electrons as in the cases of extreme ultraviolet lithography and electron beam lithography. While the fine pattern definition is due principally...
    12 KB (1,623 words) - 17:49, 28 December 2022
  • with extreme ultraviolet lithography and x-ray lithography, forcing semiconductor manufacturers to extend the current 193 nm optical lithography systems...
    13 KB (1,504 words) - 21:30, 14 June 2023
  • laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 7 nanometers in 2018. Extreme ultraviolet lithography machines...
    10 KB (1,103 words) - 21:59, 29 July 2024
  • Thumbnail for Electron-beam lithography
    from 0 to as high as 50 nm (see section New frontiers and extreme ultraviolet lithography). Hence, resist-substrate charging is not repeatable and is...
    38 KB (4,736 words) - 09:02, 10 July 2024
  • Nanolithography (category Lithography (microfabrication))
    set include multiphoton lithography, X-Ray lithography, light coupling nanolithography (LCM), and extreme ultraviolet lithography (EUVL). This last technique...
    15 KB (1,679 words) - 11:06, 19 October 2024
  • Thumbnail for CHIPS and Science Act
    them. In October, the first major NSTC site was announced, an extreme ultraviolet lithography research lab at the Albany Nanotech Complex in Albany, New...
    133 KB (12,777 words) - 17:29, 5 November 2024
  • Kaing Guek Euv (1942–2020), a Khmer Rouge leader Extreme ultraviolet (EUV) Extreme ultraviolet lithography Electric utility vehicle, a sport utility vehicle...
    589 bytes (125 words) - 10:14, 22 May 2023
  • Thumbnail for Moore's law
    generation of chips. The cost of the tools, principally EUVL (Extreme ultraviolet lithography), used to manufacture chips doubles every 4 years. Rising manufacturing...
    104 KB (10,696 words) - 15:43, 5 November 2024
  • 7 nm process (category International Technology Roadmap for Semiconductors lithography nodes)
    process, with extreme ultraviolet lithography (EUV). TSMC's "7nm" production plans, as of early 2017,[needs update] was to use deep ultraviolet (DUV) immersion...
    51 KB (4,729 words) - 23:06, 13 October 2024
  • was planned to initially use deep ultraviolet lithography, and eventually transition to extreme ultraviolet lithography. However, in August 2018, GlobalFoundries...
    82 KB (5,356 words) - 00:00, 2 November 2024
  • research and for the industry (EUV lithography). He is the author of a reference book on soft X-rays and extreme ultraviolet radiation. David Attwood received...
    3 KB (321 words) - 19:53, 10 May 2023
  • Thumbnail for Planar process
    platform uses 13.5 nm extreme ultraviolet (EUV) light, generated by a tin-based plasma source, as part of the extreme ultraviolet lithography process. Semiconductor...
    10 KB (1,016 words) - 03:15, 29 September 2024
  • Thumbnail for Samsung Electronics
    company had planned to start mass production of 5 nm chips using Extreme ultraviolet lithography (EUV) and aimed to become a leader in EUV process use. On 30...
    174 KB (15,050 words) - 00:12, 6 November 2024
  • Thumbnail for Tin
    create laser-induced plasmas that act as the light source for extreme ultraviolet lithography. Organotin compounds are organometallic compounds containing...
    81 KB (8,855 words) - 20:28, 5 November 2024
  • was reported to have visited ASML to discuss the purchase of extreme ultraviolet lithography machines. Initially, Innotron was thought to have chosen 8GB...
    13 KB (954 words) - 23:42, 7 October 2024
  • 3 nm process (category International Technology Roadmap for Semiconductors lithography nodes)
    they had taped out 3nm test chips, using extreme ultraviolet lithography (EUV) and 193 nm immersion lithography. In early 2019, Samsung presented plans...
    44 KB (3,687 words) - 19:12, 28 October 2024
  • Thumbnail for Excimer laser
    last 25 years. By around 2020, extreme ultraviolet lithography (EUV) has started to replace excimer laser lithography to further improve the resolution of...
    21 KB (2,724 words) - 20:09, 25 August 2024
  • Thumbnail for Canon Inc.
    nanoimprint lithography manufacturing systems, which it claims are simpler and more affordable than ASML's extreme ultraviolet lithography systems. The...
    50 KB (4,542 words) - 20:42, 30 October 2024
  • used for the measurement and characterization of systems for extreme ultraviolet lithography. The Center for Nanoscale Science and Technology (CNST) performs...
    49 KB (4,797 words) - 02:11, 8 November 2024
  • Thumbnail for Trumpf
    contribution to the production of modern microchips using EUV (extreme ultraviolet) lithography. This achievement was the result of a partnership with ASML...
    27 KB (2,634 words) - 15:17, 7 November 2024
  • resist various methods can be used, such as Extreme ultraviolet lithography - EUVL or Electron beam lithography - EBL. The photoresist is removed in the...
    5 KB (692 words) - 20:39, 15 February 2024
  • Thumbnail for Thomas J. Watson Research Center
    a 2 nm test chip in 2021. This group operates an advanced extreme ultraviolet lithography enabled research line which is used to support their research...
    13 KB (1,357 words) - 02:53, 7 October 2024
  • Thumbnail for Lawrence Livermore National Laboratory
    and mitigate WMD proliferation and terrorism. Development of extreme ultraviolet lithography (EUVL) for fabricating next-generation computer chips. First-ever...
    60 KB (6,424 words) - 20:49, 25 October 2024
  • Thumbnail for Stepper
    Stepper (category Lithography (microfabrication))
    technological challenges. Stepping level Photolithography Extreme ultraviolet lithography Semiconductor Integrated circuit Stepper makers: ASML Ultratech...
    23 KB (3,207 words) - 03:37, 14 March 2024
  • therefore cost. 13.5 nm extreme ultraviolet (EUV) lithography, long considered a leading candidate for next-generation lithography, began to enter commercial...
    10 KB (1,111 words) - 00:58, 10 January 2024